Merit & NSUK
July 1, 2006
We have won a short-term contract to return to the National Semiconductor (UK) Limited facility in Greenock (see our project ref #28) this time to provide simple CAD modifications to Tool hook-ups for Merit Merrell Technology Ltd of Tyne & Wear, England.
We expect this contract (our ref 068) to be complete in 3 weeks to a month
2006-10 Edit: The contract took up 3 months – the whole of 2006 Q3; we also worked on other Merit projects.
Extra words (search feature): CAD, x1900, Tam Anderson, Tom Anderson, Gary J Stewart, Alan Bryce, Ian Clark, Ewing Thompson, Ewing Thomson, Wynford J Bass, Sam Lyndsey, Sematek, DI, Ro, N2, O2, Argon, Silane, Helium, pyrophoric, stainless steel, GRP, ABS, CPVC, acid, alkali, Clean room, cleanroom, central utilities building, C.U.B., CUB, air shower, tools, furnaces, HiPox, Gasonics, LAM Research and Branson poly silicon oxide etch diffuser disc, photo, auto etch, rainbow, laserscribe, laser, scrub, diffusion, gases, toxic, semiclean, semi-clean, class 100, wafer, Endura, Centura, Varian, Novellus, Applied Materials, AMAT, Ion implant, dielectric deposition, electrochemical plating, ECMP, atomic layer deposition, HALO.
Entry Filed under: CAD, Draughting, Drawing, Surveying. .
![[Picture of National Semiconductor Logo]](http://dcdevine.files.wordpress.com/2006/10/natsemi_logo.gif)
![[Picture of Merit Merrell Logo]](http://dcdevine.files.wordpress.com/2006/10/merit.jpg)